Dobar postupak čišćenja za vakuumsko posrebrenje može poboljšati krajnji tlak opreme
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Dobar postupak čišćenja za vakuumsko posrebrenje može poboljšati krajnji tlak opreme
During the use of vacuum coating equipment, parts will also be contaminated. This contamination is related to the conditions of use and the vacuum pump. For example: the inner wall of the vacuum coating machine will be polluted by the evaporation material; the mechanical pump oil of the vacuum pumping unit of the vacuum coating equipment is the source of pollution, and the equipment will form an obvious oil film inside the equipment after long-term operation. These contaminations will also affect the performance of the equipment and should be removed at any time. Especially the ultra-high vacuum multi-target magnetron + ion beam combined sputtering equipment, its ultimate pressure is 6.6x10-Pa, and the equipped vacuum pumping group is an ultra-high vacuum system. In ultra-high vacuum systems, the cleaning process is even more important. A good cleaning process can reduce material outgassing rates by orders of magnitude. For example, after the stainless steel is exposed to the atmosphere for a long time, without any treatment, the gas output rate after pumping for 1 hour is 2.7x10-Pa-L/s m2), and it can be reduced to 1.3x10-Pa-L/ after pumping for 4 hours after removing oil stains. Csm). After baking at 250℃ for 15h, the outgas rate is further reduced to 1.3x10-Pa-L/(sm>. Dobar postupak čišćenja može povećati krajnji tlak opreme.
Materijal vakuumske komore za vakuumsko posrebrenje uglavnom je nehrđajući čelik
Materijal vakuumske komore ultravisokog vakuumskog sustava većinom je nehrđajući čelik, što je iznimno važno za čišćenje nehrđajućeg čelika. Čišćenjem se smanjuje fiziosorpcija i kemisorpcija plinova na površinama od nehrđajućeg čelika. Nečista površina nehrđajućeg čelika promatra se sekundarnim ionskim spektrometrom i Auger spektrometrom. Glavno onečišćenje su ugljik i njegovi spojevi koji pripadaju organskim tvarima. Stoga je upotreba različitih kemijskih otapala za uklanjanje površinskih organskih tvari i karbida uobičajena metoda.
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